Optical Lithography: Here is Why, Second Edition

Description

This book is written for new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get an overview of the outlook of optical lithography and means to enhance semiconductor manufacturing. This second edition blends the author’s unique experience in research, teaching, and world-class high-volume manufacturing to add brand new material on proximity printing, as well as updated and expanded material on exposure systems, image formation, E-D methodology, hardware components, processing and optimization, and EUV and immersion lithographies. cover Contents Preface to the Second Edition Chapter 1 Introduction Chapter 2 Proximity Printing Chapter 3 Exposure Systems Chapter 4 Image Formation Chapter 5 The Metrics of Lithography Chapter 6 Hardware Components in Optical Lithography Chapter 7 Processing and Optimization Chapter 8 Immersion Lithography Chapter 9 EUV Lithography Appendix A Methods to Evaluate the Region of Validity Based on Lithography Applications Index