ENGLISH

Optical Lithography: Here is Why

By Burn J. Lin

Book information

Publisher
SPIE Publications
Year
2010
ISBN
978-0-8194-7560-2
Language
english
Format
PDF
Filesize
31 MB (32346538 bytes)
Pages
473\473
Library
mirknig.com
Time added
2012-06-19 17:00:00

Description

This book is aimed at new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get a primer on the outlook of optical lithography and the many next-generation technologies that may greatly enhance semiconductor manufacturing in the near future.Topics include:Exposure SystemsImage FormationThe Meter of LithographyComponents in Optical LithographyProcessing and OptimizationImmersion LithographyOutlook for optical lithography

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