ENGLISH

Simulation of Semiconductor Processes and Devices 2001: SISPAD 01

By Zhiping Yu , Robert W. Dutton (auth.) , Dr. Dimitris Tsoukalas , Dr. Christos Tsamis (eds.)

Book information

Publisher
Springer-Verlag Wien
Year
2001
ISBN
978-3-7091-7278-0, 978-3-7091-6244-6
DOI
10.1007/978-3-7091-6244-6
Language
english
Format
PDF
Filesize
35 MB (36230348 bytes)
Edition
1
Pages
455\462
Orientation
yes
Scanned
yes
Time added
2013-08-01 04:00:00
Electronics and MicroelectronicsInstrumentation; Optical and Electronic Materials;

Description

This volume contains the Proceedings of the International Conference on Simulation of Semiconductor Devices and Processes, SISPAD 01, held on September 5–7, 2001, in Athens. The conference provided an open forum for the presentation of the latest results and trends in process and device simulation. The trend towards shrinking device dimensions and increasing complexity in process technology demands the continuous development of advanced models describing basic physical phenomena involved. New simulation tools are developed to complete the hierarchy in the Technology Computer Aided Design simulation chain between microscopic and macroscopic approaches. The conference program featured 8 invited papers, 60 papers for oral presentation and 34 papers for poster presentation, selected from a total of 165 abstracts from 30 countries around the world. These papers disclose new and interesting concepts for simulating processes and devices.

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