ENGLISH

Atomic Layer Deposition for Semiconductors

By Cheol Seong Hwang , Cha Young Yoo (auth.) , Cheol Seong Hwang (eds.)

Book information

Publisher
Springer US
Year
2014
ISBN
978-1-4614-8053-2, 978-1-4614-8054-9
DOI
10.1007/978-1-4614-8054-9
Language
english
Format
PDF
Filesize
6 MB (6745185 bytes)
Edition
1
Pages
263\265
Orientation
yes
Scanned
yes
Time added
2013-10-30 23:49:31
Electrochemistry;Semiconductors;Memory Structures;Instrumentation

Description

This edited volume discusses atomic layer deposition (ALD) for all modern semiconductor devices, moving from the basic chemistry of ALD and modeling of ALD processes to sections on ALD for memories, logic devices, and machines. The section on ALD for memories covers both mass-produced memories, such as DRAM and Flash, and emerging memories, such as PCRAM and FeRAM. The section on ALD for logic devices covers both front-end of the line processes and back-end of the line processes. The final section on ALD for machines looks at toolsets and systems hardware. Each chapter provides the history, operating principles, and a full explanation of ALD processes for each device.

Similar books