ENGLISH

Handbook of Thin Film Process Technology 98/1 Reactive sputtering

By Westwood , William Dickson;D Glocker; S Shah

Book information

Publisher
Institute of Physics Publishing;CRC Press
Year
1998
ISBN
0-7503-0528-2, 978-1-315-89368-6, 978-1-351-07278-6, 9780750305280
Language
english
Format
PDF
Filesize
6 MB (5871733 bytes)
Edition
1
Pages
76\90
Time added
2018-04-04 20:00:00
etc.;Surfaces (Technology) -- Handbooksetc.;Surfaces (Technology);Thin films.manualsThin films -- Handbooks

Description

The Handbook of Thin Film Process Technology is a practical handbook for the thin film scientist, engineer and technician. The main work is regularly updated with new material, and this volume is a special issue on reactive sputtering which will be of interest to a wide range of industrial and academic researchers in addition to owners of the main Handbook. Some recent developments in the reactive sputtering field are covered, including unbalanced magnetron sputtering and pulsed reactive sputtering. The articles contain a wealth of practical information relating to applications, practice and manufacturing techniques

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