ENGLISH

Reactive Sputter Deposition

By Tadayoshi Ono , Takahiro Kenmotsu , Tetsuya Muramoto (auth.) , Dr. Diederik Depla , Dr. Stijn Mahieu (eds.)

Book information

Publisher
Springer-Verlag Berlin Heidelberg
Year
2008
ISBN
978-3-540-76662-9, 978-3-540-76664-3
DOI
10.1007/978-3-540-76664-3
Language
english
Format
PDF
Filesize
21 MB (22237322 bytes)
Series
Springer Series in Materials Science 109
Edition
1
Pages
572\583
Orientation
yes
Scanned
yes
Time added
2013-08-01 04:00:00
Surfaces and InterfacesThin Films; Condensed Matter Physics; Physical Che

Description

The use of thin films is continuously expanding. In the family of Physical Vapour Deposition techniques, sputtering is one of the most important over the past 40 years. In this book, all aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth, are described in detail, allowing the reader to understand the complete process. Hence, this book gives necessary information for those who want to: - start with reactive magnetron sputtering - understand and investigate the technique - control their sputtering process - tune their existing process, obtaining the desired thin films.

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