ENGLISH

High-K Gate Dielectrics

Book information

Publisher
Taylor & Francis
Year
2003
ISBN
0750309067, 9780750309066, 9781420034141
LCC
TK7871.99.M44 H49 2004
Open Library ID
OL22583799M
Language
english
Format
PDF
Filesize
9 MB (9197156 bytes)
Series
Series in Material Science and Engineering
Edition
1
Pages
613\613
Library
mexmat
Time added
2009-11-09 02:42:13

Description

The drive toward smaller and smaller electronic componentry has huge implications for the materials currently being used. As quantum mechanical effects begin to dominate, conventional materials will be unable to function at scales much smaller than those in current use. For this reason, new materials with higher electrical permittivity will be required, making this is a subject of intensive research activity within the microelectronics community.High k Gate Dielectrics reviews the state-of-the-art in high permittivity gate dielectric research. Consisting of contributions from leading researchers from Europe and the USA, the book first describes the various deposition techniques used for construction of layers at these dimensions. It then considers characterization techniques of the physical, chemical, structural, and electronic properties of these materials. The book also reviews the theoretical work done in the field and concludes with technological applications.

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