Particles on Surfaces, Volume 7: Detection, Adhesion and Removal

Description

This volume documents the proceedings of the 7th International Symposium on Particles on Surfaces: Detection, Adhesion and Removal held in Newark, NJ, June 19-21, 2000. The study of particles on surfaces is extremely important in a host of diverse technological areas, ranging from microelectronics to optics to biomedical. This volume contains a total of 28 papers, which were all properly peer reviewed, revised and edited before inclusion. Therefore, this book is not merely a collection of unreviewed manuscripts, but rather represents information which has passed peer scrutiny. Furthermore, the authors were asked to update their manuscripts, so the information contained in this book should be current and fresh. This volume is divided into two parts: 1) Particle Analysis and General Cleaning-Related Topics; and 2) Particle Adhesion and Removal. The topics covered include: surface analysis techniques for particle identification; cleaning, rinsing and drying issues in post-CMP cleaning; fundamental forces involved in particle adhesion; factors affecting adhesion of small (nanosize) particles; factors important in particle detachment; particle adhesion measurement by AFM; various (wet and dry) techniques for particle removal, e.g., laser, ultrasonic, megasonic, use of surfactants; toner particles and pharmaceutical particles. This volume offers a wealth of information on the tremendously technologically important field of particles on surfaces and should provide a consolidated source of current R&D activity in this arena. Therefore, it will be of value and use to anyone interested in the topic of particles on surfaces. Cover Half Title Title Page Copyright Page Table of Contents Preface Part 1: Particle Analysis and General Cleaning-Related Topics Applying Surface Analysis Techniques for Particle Identification Total Reflection and Grazing Emission X-Ray Fluorescence Spectrometry: Assessment of the Size of Contaminant Particles on Silicon Wafer Surfaces Development of a Particle Deposition Meter Reduction of Cleaning and Verification Times for an Aqueous Based Process by On-Line Monitoring Implementation of the IMEC-Cleaning in Advanced CMOS Manufacturing Cleaning, Rinsing and Drying Issues in Post-Cu CMP Cleaning: A Case Study Aging Effects in Test Silicon Wafers Prepared for Wafer Cleaning Process Evaluation Part 2: Particle Adhesion and Removal Adhesion of Small Particles and Innovative Methods for Their Removal Effects of Surface Roughness on Van Der Waals and Electrostatic Contributions to Particle-Particle Interactions and Particle Adhesion Effect of Surface Hydrophobicity on the Detachment of Particles from Surfaces Adhesion and Removal of Particles from Charged Surfaces Under a Humidity-Controlled Air Stream Adhesion Measurements by AFM and Surface Energy Characteristics by IGC of Xerographic Toner Particles Under Different Mechanical and Environmental Conditions Measurements of Adhesion Forces in Pharmaceutical Powder-Polymer Systems by Atomic Force Microscopy Direct Adhesion Measurements Between Pharmaceutical Materials Laser Assisted Particle Removal Laser Removal of Particles from Solid Surfaces Laser Assisted Particle Removal from Silicon Wafers Laser Cleaning of Silicon Membrane Stencil Masks Transient Laser-Based Surface Acceleration Simulations for Particle Removal Particle Removal from Semiconductor Substrates Using the PLASMAX Technology Particle Removal with Ultrasonics and Megasonics Influence of Temperature and Dissolved Air on Megasonic Particle Removal A Study of Particle Removal Based on Monte Carlo Simulation of Ion Interactions Removal of Fibrin Coated Particles from Surfaces Enhancement of Particle Removal and Modification of Interfacial Phenomena Using Surfactants The Enhancement of Particle Removal by Adding Valtron SP2200 Surfactant into SC1 Solution Optimization of Particle Removal Performance of dHF-Based Cleaning Recipes Spray Cleaning with Hydrofluorocarbon Solutions