ENGLISH

Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies

By T. E. G. Daenen , D. L. De Kubber (auth.) , Yves Pauleau (eds.)

Book information

Publisher
Springer Netherlands
Year
2002
ISBN
978-1-4020-0525-1, 978-94-010-0353-7
DOI
10.1007/978-94-010-0353-7
Language
english
Format
PDF
Filesize
15 MB (15277403 bytes)
Series
NATO Science Series 55
Edition
1
Pages
363\371
Orientation
yes
Scanned
yes
Time added
2013-08-01 04:00:00
Surfaces and InterfacesThin Films; Physical Chemistry; Industrial Chemist

Description

An up-to-date collection of tutorial papers on the latest advances in the deposition and growth of thin films for micro and nano technologies. The emphasis is on fundamental aspects, principles and applications of deposition techniques used for the fabrication of micro and nano devices. The deposition of thin films is described, emphasising the gas phase and surface chemistry and its effects on the growth rates and properties of films. Gas-phase phenomena, surface chemistry, growth mechanisms and the modelling of deposition processes are thoroughly described and discussed to provide a clear understanding of the growth of thin films and microstructures via thermally activated, laser induced, photon assisted, ion beam assisted, and plasma enhanced vapour deposition processes. A handbook for engineers and scientists and an introduction for students of microelectronics.

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