ENGLISH

Design for Manufacturability with Advanced Lithography

By Bei Yu , David Z. Pan (auth.)

Book information

Publisher
Springer International Publishing
Year
2016
ISBN
978-3-319-20384-3, 978-3-319-20385-0
DOI
10.1007/978-3-319-20385-0
Language
english
Format
PDF
Filesize
5 MB (5577022 bytes)
Edition
1
Pages
XI, 164\173
Time added
2015-11-25 16:51:03
Circuits and Systems; Processor Architectures; EleInstrumentation

Description

This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.

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