ENGLISH

Physical Design and Mask Synthesis for Directed Self-Assembly Lithography

By Youngsoo Shin , Seongbo Shim

Book information

Publisher
Springer International Publishing
Year
2018
ISBN
978-3-319-76293-7, 978-3-319-76294-4
Language
english
Format
PDF
Filesize
12 MB (12910966 bytes)
Series
NanoScience and Technology
Edition
1st ed.
Pages
XIV, 138\144
Time added
2018-08-15 07:07:45
Materials Science; Nanotechnology; Nanotechnology

Description

This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology. Front Matter ....Pages i-xiv Introduction (Seongbo Shim, Youngsoo Shin)....Pages 1-12 Front Matter ....Pages 13-13 DSAL Manufacturability (Seongbo Shim, Youngsoo Shin)....Pages 15-24 Placement Optimization for DSAL (Seongbo Shim, Youngsoo Shin)....Pages 25-39 Post-Placement Optimization for MP-DSAL Compliant Layout (Seongbo Shim, Youngsoo Shin)....Pages 41-50 Redundant Via Insertion for DSAL (Seongbo Shim, Youngsoo Shin)....Pages 51-61 Redundant Via Insertion for MP-DSAL (Seongbo Shim, Youngsoo Shin)....Pages 63-73 Front Matter ....Pages 75-75 DSAL Mask Synthesis (Seongbo Shim, Youngsoo Shin)....Pages 77-92 Verification of Guide Patterns (Seongbo Shim, Youngsoo Shin)....Pages 93-115 Cut Optimization (Seongbo Shim, Youngsoo Shin)....Pages 117-130 Summary of The Book (Seongbo Shim, Youngsoo Shin)....Pages 131-133 Back Matter ....Pages 135-138

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