ENGLISH

Integrated Modeling of Chemical Mechanical Planarization for Sub-Micron IC Fabrication: From Particle Scale to Feature, Die and Wafer Scales

By Jianfeng Luo , David A. Dornfeld (auth.)

Book information

Publisher
Springer-Verlag Berlin Heidelberg
Year
2004
ISBN
978-3-642-06115-8, 978-3-662-07928-7
DOI
10.1007/978-3-662-07928-7
Language
english
Format
PDF
Filesize
12 MB (12934836 bytes)
Edition
1
Pages
311\326
Orientation
yes
Scanned
yes
Time added
2013-08-01 04:00:00
Industrial Chemistry/Chemical Engineering; SurfaceInstrumentation; Surfaces and InterfacesThin Films; Circuits and Systems; Electronics andThin Films; Physical Chemistry

Description

This book is the product of a developing research focus on CMP at Berkeley. Its focus is on the important area of process models which have not kept pace with the tremendous expansion of applications of CMP. It specifically deals with the development of models with sufficient detail to allow the evaluation and tradeoff of process inputs and parameters to assess impact on quality or quantity of production. The important role of the mechanical elements of the process are included in such an "integrated model". The objective of the book is to introduce some background on the overlooked mechanical aspects of the process - including pad surface topography and abrasive particles. The "integrated model" can be particularly useful as one looks towards optimization of the process, design of consumables and, importantly, looking to minimize the environmental affects of CMP.

Similar books