ENGLISH

Chemical Vapor Deposition for Microelectronics: Principles, Technology and Applications (Materials Science and Process Technology)

By Arthur Sherman

Book information

Year
1989
ISBN
0815511361, 9780815511366, 9780815516392
LCC
TS695 .S54 1987
Open Library ID
OL2382555M
Language
english
Format
PDF
Filesize
11 MB (11486970 bytes)
Edition
1st
Pages
226\229
Time added
2011-06-04 13:46:07
Междисциплинарные материалы

Description

Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.

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