ENGLISH

Ion Implantation Technology-94: Proceedings of the Tenth International Conference on Ion Implantation Technology Catania, Italy, June 13-17, 1994

By E. (eds.) , Coffa , S.; Ferla , G.; Priolo , F; Rimini

Book information

Publisher
North-Holland
Year
1995
ISBN
0444821945, 9780444821942
Language
english
Format
PDF
Filesize
207 MB (216781471 bytes)
Pages
1012\1031
Scanned
yes
Time added
2015-12-13 11:00:00
Semiconductors Electronics Electrical Engineering

Description

The aim of these proceedings is to present and stimulate discussion on the many subjects related to ion implantation among a broad mix of specialists from areas as diverse as materials science, device production and advanced ion implanters. The contents open with a paper on the future developments of the microelectronics industry in Europe within the framework of the global competition. The subsequent invited and oral presentations cover in detail the following areas: trends in processing and devices, ion-solid interaction, materials science issues, advanced implanter systms, process control and yield, future trends and applications.

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