Polymers in Electronics

Description

Content: Applications of photoinitiated cationic polymerization to the development of new photoresists / J.V. Crivello -- Applications of photoinitiators to the design of resists for semiconductor manufacturing / Hiroshi Ito and C. Grant Willson -- Semiempirical calculations of electronic spectra : use in the design of mid-UV sensitizers / R.D. Miller, D.R. Mckean, T.L. Tompkins, N. Clecak, C. Grant Willson, J. Michl, and J. Downing -- Mid-UV photosensitization of diazoquinone positive photoresists / W.T. Babie, M-F. Chow, and W.M. Moreau -- Deep UV photolithography with composite photoresists made of poly(olefin sulfones) / H. Hiraoka and L.W. Welsh, Jr. -- Method for a comparative study of positive photoresist lithographic performance / C.C. Walker and J.N. Helbert -- Dependence of dissolution rate on processing and molecular parameters of resists / A.C. Ouano -- Effect of composition on resist dry-etching susceptibility : novel vinyl polymers / J.N. Helbert, M.A. Schmidt, C. Malkiewicz, E. Wallace, Jr., and C.U. Pittman, Jr. -- Resists for electron beam lithography / Toshiaki Tamamura, Saburo Imamura, and Shungo Sugawara -- Chain-scission yields of methacrylate copolymers under electron beam radiation / C.C. Anderson, P.D. Krasicky, F. Rodriguez, Y. Namaste, and S.K. Obendorf -- Poly(tetrafluorochloropropyl methacrylate) as positive electron resist / B. Bednář, J. Devátý, J. Králíček, and J. Zachoval -- Radiation-induced degradation of poly(2-methyl-1-pentene sulfone) : kinetics and mechanism / M.J. Bowden, D.L. Allara, W.I. Vroom, J. Frackoviak, L.C. Kelley, and D.R. Falcone -- The radiation degradation of poly(2-methyl-1-pentene sulfone) : radiolysis products / T.N. Bowmer and M.J. Bowden -- Novolac based positive electron beam resist containing a polymeric dissolution inhibitor : preparation and exposure characteristics / Hiroshi Shiraishi, Asao Isobe, Fumio Murai, and Saburo Nonogaki -- Molecular design for cross-linking negative resists : relationship between sensitivity and component ratio in copolymer resists / Katsumi Tanigaki, Yoshitake Ohnishi, and Shozo Fujiwara -- Molecular design for cross-linking negative resists : optimum design for poly(chloromethylstyrene-co-2-vinylnaphthalene) / Yoshitake Ohnishi, Katsumi Tanigaki, and Akihiro Furuta -- Poly(butadiene-co-glycidyl methacrylate) as negative electron resist / B. Bednář, J. Devátý, J. Králíček, and J. Zachoval -- Plasma developable electron resists / Juey H. Lai -- Solution characterization of polyamic acids and polyimides / P. Metzger Cotts and W. Volksen -- Ultrapure polyimides : syntheses and applications / J. Duran and N.S. Viswanathan -- Photosensitive polyimide siloxane / Gary C. Davis -- Catalysts for epoxy molding compounds in microelectronic encapsulation / Winston C. Mih -- Thermogravimetric analysis of silicone elastomers as integrated circuit device encapsulants / Ching-Ping Wong -- Removable polyurethane encapsulants / K.B. Wischmann -- Improvements to microcircuit reliability by the use of inhibited encapsulants / F.W. Ainger, J. Brettle, I. Dix, and M.T. Goosey -- Photopolymer dielectrics : the characterization of curing behavior for modified acrylate systems / R.D. Small, J.A. Ors, and B.S.H. Royce -- Morphology of rubber-modified photopolymers / J.A. Ors and J.B. Enns -- UV solder masks as insulators for printed circuit boards / Neil S. Fox -- UV-curable conformal coatings / C.R. Morgan, D.R. Kyle, and R.W. Bush -- Thermal expansion coefficients of leadless chip carrier compatible printed wiring boards / Z.N. Sanjana, R.S. Raghava, and J.R. Marchetti -- Piezoelectric poly(vinylidene fluoride) in small-bore, thick-walled tubular form : continuous production and properties / P. Pantelis -- Polymeric reactions in magnetic recording media / Lesley J. Goldstein -- Fabrication of conductive polyimide-gate transistors / David R. Day -- Redox properties of conjugated polymers : a successful correlation of theory and experiment / R.R. Chance, D.S. Boudreaux, J.L. Bredas, and R. Silbey -- A novel phase of organic conductors : conducting polymer solutions / J.E. Frommer, R.L. Elsenbaumer, and R.R. Chance -- Poly-p-phenylene selenide and poly-p-phenylene telluride : characterization and assessment as active elements / L.A. Acampora, D.L. Dugger, T. Emma, J. Mohammed, M.F. Rubner, L. Samuelson, D.J. Sandman, and S.K. Tripathy -- Electrochemical synthesis and characterization of poly(2,2'-bithiophene) / M.A. Druy, R.J. Seymour, and S.K. Tripathy -- The influence of microstructure on the properties of polyacetylene/polybutadiene blends / S.K. Tripathy and M.F. Rubner -- Ethylene-propylene-diene terpolymer/polyacetylene and styrene-diene triblock copolymer/polyacetylene blends : characterization and stability studies / Kang I. Lee and Harriet Jopson -- Conductive hybrids based on polyacetylene: copolymers and blends / M.E. Galvin, G.F. Dandreaux, and G.E. Wnek -- Electrically conductive polymer composites of 7,7,8,8-tetracyanoquinodimethane (TCNQ) salt dispersion : influence of charge-transfer interaction and film morphology / Oh-Kil Kim -- Synthesis and properties of conducting films by plasma polymerization of tetramethyltin / R.K. Sadhir and W.J. James -- Plasma polymerized organometallic thin films : preparation and properties / R.K. Sadhir, H.E. Saunders, and W.J. James -- Polyacetylene, (CH)x : an electrode-active material in aqueous and nonaqueous electrolytes / R.B. Kaner, A.G. Macdiarmid, and R.J. Mammone