ENGLISH

Handbook of Cleaning for Semiconductor Manufacturing - Fundamentals and Applications

By Reinhardt , Karen A.; Reidy , Richard F.(eds.)

Book information

Publisher
Wiley - Scrivener
Year
2011
ISBN
978-1-61344-177-0, 978-0-470-62595-8
Language
english
Format
PDF
Filesize
31 MB (32915496 bytes)
Pages
601\477
Orientation
yes
Scanned
landscape
Time added
2013-08-14 18:00:00

Description

This comprehensive volume provides an in-depth discussion of the fundamentals of cleaning and surface conditioning of semiconductor applications such as high-k/metal gate cleaning, copper/low-k cleaning, high dose implant stripping, and silicon and SiGe passivation. The theory and fundamental physics associated with wet etching and wet cleaning is reviewed, plus the surface and colloidal aspects of wet processing. Formulation development practices and methodology are presented along with the applications for preventing copper corrosion, cleaning aluminum lines, and other sensitive layers. This is a must-have reference for any engineer or manager associated with using or supplying cleaning and contamination free technologies for semiconductor manufacturing.

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