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Advances in Imaging and Electron Physics, Volume 199, the latest release in a series that merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy features extended articles on the physics of electron devices (especially semiconductor devices). Specific topics include discussions on Micro-XRF in scanning electron microscopes, and an interesting take on the variational approach for simulation of equilibrium ion distributions in ion traps regarding Coulomb interaction, amongst others. Users will find a comprehensive resource on the most important aspects of particle optics at high and low energies, microlithography, image science and digital image processing. In addition, topics of interest, including electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains are presented and discussed. Content: Series PagePage ii CopyrightPage iv ContributorsPage vii PrefacePages ix-xPeter W. Hawkes Future ContributionsPages xi-xiii Chapter One - Micro-XRF in Scanning Electron MicroscopesPages 1-60Michael Haschke, Stephan Boehm Chapter Two - A Variational Approach for Simulation of Equilibrium Ion Distributions in Ion Traps With Regard to Coulomb InteractionPages 61-73Igor A. Kopaev, Dmitry Grinfeld, Mikhail A. Monastyrskiy, Roman S. Ablizen, Sergei S. Alimpiev, Andrei A. Trubitsyn Chapter Three - Analytical Review of Direct Stem Imaging Techniques for Thin SamplesPages 75-184Ivan Lazić, Eric G.T. Bosch Chapter Four - Quantum Nanooptics in the Electron MicroscopePages 185-235Luiz H.G. Tizei, Mathieu Kociak Chapter Five - Component Identification and Interpretation: A Perspective on Tower of KnowledgePages 237-301Mai Xu, Jie Ren, Zulin Wang IndexPages 303-309