ENGLISH

Ion Impantation Technology: 16th International Conference on Ion Implantation Technology; IIT 2006 (AIP Conference Proceedings Accelerators, Beams, and Instrumentations)

By Andy Smith , Karen J. Kirkby , Russell Gwilliam , David Chivers

Book information

Publisher
American Inst. of Physics
Year
2006
ISBN
0735403651, 9780735403659
LCC
QC702.7.I55 I577 2006
Open Library ID
OL18524595M
Language
english
Format
PDF
Filesize
32 MB (33092699 bytes)
Edition
1
Pages
645\645
Scanned
yes
Time added
2011-08-31 04:54:40

Description

This is the premier world conference for the presentation of the latest advances in ion implantation, from the fundamentals of ion-solid interactions to manufacturing implant equipment. All papers were peer-reviewed. Ion implantation is used to manufacture semiconductor devices. Materials properties are changed by bombarding wafers with atoms, which are accelerated in an ion implanter.

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