ENGLISH

Nanolithography: The art of fabricating nanoelectronic and nanophotonic devices and systems

By Martin Feldman

Book information

Publisher
Woodhead Publishing
Year
2014
ISBN
978-0-85709-500-8, 978-0-85709-875-7, 0857094173, 978-0-85709-417-9, 978-1-84569-936-9, 978-0-85709-272-4
Language
english
Format
PDF
Filesize
42 MB (43654187 bytes)
Series
Woodhead Publishing Series in Electronic and Optical Materials 42
Edition
1
Pages
432\597
Time added
2014-02-12 18:00:00

Description

Lithography is the process of patterning and etching to create integrated circuits and other devices on semiconductor wafers. Photolithography cannot be scaled down much further so in order to cope with the future reduction in size of semiconductor chips to nanoscale dimensions, scientists have turned to alternative nanolithography technologies. In addition to scaling issues, the increasing integration of multiple functions within a single device poses further challenges which drive innovations in nanolithography and nanofabrication. Chapters cover lithographic techniques, including optical projection, extreme ultraviolet (EUV), nanoimprint, electron beam and ion beam lithography, and applications of nanolithography in nanoelectronics, nanophotonics and microfluidics.

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