ENGLISH

Handbook of Advanced Plasma Processing Techniques

By J. W. Coburn (auth.) , Dr. Randy J. Shul , Professor Stephen J. Pearton (eds.)

Book information

Publisher
Springer-Verlag Berlin Heidelberg
Year
2000
ISBN
978-3-642-63096-5, 978-3-642-56989-0
DOI
10.1007/978-3-642-56989-0
Language
english
Format
PDF
Filesize
22 MB (22850684 bytes)
Edition
1
Pages
655\663
Orientation
yes
Scanned
yes
Time added
2013-08-01 04:00:00
general;Characterization and Evaluation of MateriaMaterials Treatment;EngineeringMolecularOptical and Plasma Physics;Optical and ElectronicSurfaces and InterfacesThin Films;Atomic

Description

This volume covers the topic of advanced plasma processing techniques, from the fundamental physics of plasmas to diagnostics, modeling and applications such as etching and deposition for microelectronics. The use of plasmas for patterning on a submicron scale has enabled successive generations of continually smaller transistors, lasers, micromachines, sensors and magnetic read/write heads that have formed the basis of our information age. This volume is the first to give coverage to this broad area of topics in a detailed fashion, especially in the rapidly expanding fields of micro-mechanical machines, photomask fabrication, magnetic data storage and reactor modeling. It provides the reader with a broad array of topics, authored by the leading experts in the field.

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