ENGLISH

Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applicatons

By Cameron D. , Kääriäinen T. , Kääriäinen M.-L. , Sherman A.

Book information

Language
english
Format
PDF
Filesize
3 MB (3000470 bytes)
Pages
\265
Library
twirpx
Time added
2017-08-07 07:01:42
Специальные дисциплины;Наноматериалы и нанотехноло

Description

2nd Edition. — Wiley, 2013. — 265 p.Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.

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