ENGLISH

Handbook of Thin-Film Deposition Processes and Techniques - Principles, Methods, Equipment and Applications

By Seshan , K.(eds.)

Book information

Publisher
William Andrew Publishing/Noyes
Year
2002
ISBN
978-0-8155-1778-8, 978-0-8155-1442-8
Language
english
Format
PDF
Filesize
8 MB (7914846 bytes)
Edition
2nd Edition
Pages
676\684
Orientation
yes
Scanned
landscape
Time added
2013-08-14 18:00:00

Description

This book includes much cutting-edge material. Entirely new chapters on contamination and contamination control describe the basics and the issues - as feature sizes shrink to sub-micron dimensions, cleanliness and particle elimination has to keep pace. A new chapter on meterology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together all the physical vapor deposition techniques. Two entirely new areas receive full treatment: chemical mechanical polishing, which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials.

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