ENGLISH

Predictive Simulation of Semiconductor Processing: Status and Challenges

By J. Dąbrowski , E. R. Weber , H.-J. Müssig (auth.) , Dr. Jarek Dabrowski , Professor Dr. Eicke R. Weber (eds.)

Book information

Publisher
Springer-Verlag Berlin Heidelberg
Year
2004
ISBN
978-3-642-05804-2, 978-3-662-09432-7
DOI
10.1007/978-3-662-09432-7
Language
english
Format
PDF
Filesize
14 MB (14325385 bytes)
Series
Springer Series in MATERIALS SCIENCE 72
Edition
1
Pages
490\504
Orientation
yes
Scanned
yes
Time added
2013-08-01 04:00:00
general;Operating ProceduresMaterials TreatmentNanotechnology;Characterization and Evaluation of

Description

Predictive simulation of semiconductor processing enables researchers and developers to extend the scaling range of semiconductor devices beyond the parameter range of empirical research. It requires a thorough understanding of the basic mechanisms employed in device fabrication, such as diffusion, ion implantation, epitaxy, defect formation and annealing, and contamination. This book presents an in-depth discussion of our current understanding of key processes and identifies areas that require further work in order to achieve the goal of a comprehensive, predictive process simulation tool.

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