Polymeric Materials for Microelectronic Applications. Science and Technology

Description

Content: Photophysics, photochemistry, and photo-optical effects in polymer solids / Kazuyuki Horie -- Photochemistry of liquid-crystalline polymers / David Creed, Richard A. Cozad, Anselm C. Griffin, Charles E. Hoyle, Lixin Jin, Petharnan Subramanian, Sangya S. Varma, and Krishnan Venkataram -- Dissociative electron capture of polymers with bridging acid anhydrides : matrix isolation electron spin resonance study / Paul H. Kasai -- Luminescence study of ion-irradiated aromatic polymers / Y. Aoki, H. Namba, F. Hosoi, and S. Nagai -- New directions in the design of chemically amplified resists / E. Reichmanis, M.E. Galvin, K.E. Uhrich, P. Mirau, and S.A. Heffner -- Dual-tone and aqueous base developable negative resists based on acid-catalyzed dehydration / Hiroshi Ito and Yasunari Maekawa -- Importance of donor-acceptor reactions for the photogeneration of acid in chemically amplified resists / Nigel P. Hacker -- Acid generation in chemically amplified resist films / Takeo Watanabe, Yoshio Yamashita, Takahiro Kozawa, Yoichi Yoshida, and Seiichi Tagawa -- Radiation-induced reactions of onium salts in novolak / Takahiro Kozawa, M. Uesaka, Takeo Watanabe, Yoshio Yamashita, H. Shibata, Yoichi Yoshida, and Seiichi Tagawa -- Polymeric sulfonium salts as acid generators for excimer laser lithography / Katsumi Maeda, Kaichiro Nakano, and Etsuo Hasegawa -- Application of triaryl phosphate to photosensitive materials : photoreaction mechanism of triaryl phosphate / I. Naito, A. Kinoshita, Y. Okamoto, and S. Takamuku -- Effect of water on the surface insoluble layer of chemically amplified positive resists / Jiro Nakamura, Hiroshi Ban, Yoshio Kawai, and Akinobu Tanaka -- Thermal properties of a chemically amplified resist resin / Koji Asakawa, Akinori Hongu, Naohiko Oyasato, and Makoto Nakase -- Modeling and simulation of chemically amplified resist systems / Akinori Hongu, Koji Asakawa, Tohru Ushirogouchi, Hiromitsu Wakabayashi, Satoshi Saito, and Makoto Nakase -- Surface imaging using photoinduced acid-catalyzed formation of polysiloxanes at air-polymer interface / Masamitsu Shirai, Tomonobu Sumino, and Masahiro Tsunooka -- Surface imaging for applications to sub-0.35-[micrometer] lithography / Ki-Ho Baik and Luc Van den hove -- Molecular design of epoxy resins for microelectronics packaging / Masashi Kaji -- Uniaxial and in-plane molecular orientation of polyimides and their precursor as studied by absorption dichroism of perylenebisimide dye / M. Hasegawa, T. Matano, Y. Shindo, and T. Sugimura -- Novel photosensitive polyimide precursor based on polyisoimide using nifedipine as a dissolution inhibitor / Amane Mochizuki, Tadashi Teranishi, Mitsuru Ueda, and Toshihiko Omote -- Photochemical behavior of nifedipine derivatives and application to photosensitive polyimides / T. Yamaoka, S. Yokoyama, T. Omote, K. Naitoh, and K. Yoshida -- Waveguiding in high-temperature-stable materials / C. Feger, S. Perutz, R. Reuter, J.E. McGrath, M. Osterfeld, and H. Franke -- Rodlike fluorinated polyimide as an in-plane birefringent optical material / Shinji Ando, Takashi Sawada, and Yasuyuki Inoue -- Preparation of polyphenylene and copolymers for microelectronics applications / N.A. Johnen, H.K. Kim, and C.K. Ober -- Charge-carrier generation and migration in a polydiacetylene compound studied by pulse radiolysis time-resolved microwave conductivity -- G.P. van der Laan, M.P. de Haas, J.M. Warman, D.M. de Leeuw, and J. Tsibouklis -- Excitation dynamics in conjugated polymers / H. Bässler, E.O. Göbel, A. Greiner, R. Kersting, H. Kurz, U. Lemmer, R.F. Mahrt, and Y. Wada -- Application of polyaniline films to radiation dosimetry / Yuichi Oki, Takenori Suzuki, Taichi Miura, Masaharu Numajiri, and Kenjiro Kondo -- Present and future of fullerenes : C₆₀ and tubules / Katsumi Tanigaki -- Photoresponsive liquid-crystalline polymers : holographic storage, digital storage, and holographic optical components / Klaus Anderle and Joachim H. Wendorff -- Azimuthal alignment photocontrol of liquid crystals / Kunihiro Ichimura -- Electronic structure and UV absorption spectra of permethylated silicon chains / Harald S. Plitt, John W. Downing, Hiroyuki Teramae, Mary Katherine Raymond, and Josef Michl -- Electronic properties of polysilanes / R.G. Kepler and Z.G. Soos -- UV photoelectron spectroscopy of polysilanes and polygermanes / Kazuhiko Seki, Akira Yuyama, Satoru Narioka, Hisao Ishii, Shinji Hasegawa, Hiroaki Isaka, Masaie Fujino, Michiya Fujiki, and Nobuo Matsumoto -- Radical ions of polysilynes / Akira Watanabe, Minoru Matsuda, Yoichi Yoshida, and Seiichi Tagawa -- Optical properties of silicon-based polymers with different backbone structures / Katsunori Suzuki, Yoshihiko Kanemitsu, Soichiro Kyushin, and Hideyuki Matsumoto -- Synthesis and properties of polysilanes prepared by ring-opening polymerization / Eric Fossum and Krzysztof Matyjaszewski -- New synthesis and functionalization of photosensitive poly(silyl ether) by addition reaction of bisepoxide with dichlorosilane / Atsushi Kameyama, Nobuyuki Hayashi, and Tadatomi Nishikubo.